采用磁控溅射法制备一种适合用于硅基微磁通门的新型非晶Fe96Nb4软磁铁芯薄膜,并利用X射线衍射仪、扫描电子显微镜、振动样品磁强计测试薄膜的相组成、表面形貌、和磁滞回线,用双铁芯磁通门探头线圈对制作的铁芯薄膜进行试验.结果表明:随制备温度的升高,薄膜的缺陷明显减小,软磁性能显著改善.基片温度为630 K时制作的硅基Fe96Nb4铁芯薄膜的性能适合用于微磁通门铁芯材料.
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