研究了磁场作用下电沉积Ni金属膜的生长过程,磁场与电极表面夹角取35°.测试结果表明电流密度、基底织构和磁场对薄膜的织构和表面形貌均具有重要影响.随着电流密度的增加,薄膜的面外织构由(111)为主变为(200)为主,面内织构显著改善;晶粒尺寸随着电流密度的增加显著增大.在电流密度较小时,磁场的作用比较显著,使得面外(111)晶面取向受到抑制,(200)取向得到增强,面内织构也有一定的改善.同时,磁场使晶粒变小,形状更加规则,整体也更均匀.还对磁场、电流和基底的作用机制进行了分析.
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