采用磁控溅射法在Pt/Ti/SiO2/Si衬底上制备了(Ba,Sr)TiO3薄膜.基于薄膜的形核理论,研究了溅射气压、靶基距、衬底温度和溅射功率等溅射参数对(Ba,Sr) TiO3薄膜择优取向生长的影响.实验结果表明:磁控溅射中,较高衬底温度(600℃)有助于钙钛矿成相；通过改变磁控溅射参数,能得到(111)、(001)、(110)择优取向的薄膜.
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