运用XRD、EPMA、TEM等手段分析在Ti—6Al—4V基材上用激光化学气相反应生长的Ti(C,N)薄膜的成分、结构、显微组织可在基材表面形成大面积均匀的Ti(C,N)膜层,为无明显择优取向的等轴纳米晶,其中有少量的Ti2N相,且Al、V含量低于基材。
The composition and microstructure of Ti(C,N) films, which were produced by laser chemical deposition on Ti-6Al-4V substrate, were studied by the combined techniques of XRD, EPMA,TEM. The large area, uniform films which were mainly Ti(C,N) with small amou
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