采用离子束溅射方法在单晶Si(100)基片上沉积厚度为100nm的Al2O3薄膜,利用原子力显微镜、X射线光电子能谱、掠入射衍射等微观分析手段,研究了薄膜的表面形貌、粗糙度、成分,及退火后微观结构的变化.研究表明:室温沉积在基片上的纳米薄膜为非晶态,纳米颗粒为无方向性沉积,颗粒呈团球状,其成分基本满足Al2O3的标准成分配比.850℃×6h退火处理后,生成晶态的γ-Al2O3薄膜表面结晶完整,颗粒清晰可见.
参考文献
| [1] | Miyazaki T;N Tezuka .Giant mngnetic tunneling effect in Fe/Al2O3/Fe junction[J].Journal of Magnetism and Magnetic Materials,1995,139:L231. |
| [2] | Moodera J S;Kinder L R;Wong T M et al.Large magnetoresisitance at room temperature in ferromagnetic thin film tunnel junctions[J].Pbys Rev Lett,1995,74:3273-3276. |
| [3] | C. Maunoury;N. Marsot;T. Devolder .Magnetic properties of Co/Al_2O_3/Co junctions deposited by ultra high vacuum ion beam sputtering[J].Materials Science & Engineering, B. Solid-State Materials for Advanced Technology,2004(1/3):213-216. |
| [4] | Oubensaid EH;Maunoury C;Devolder T;Marsot N;Schwebel C .Characterizations of Co/Al2O3/Co/NiFe multilayers elaborated by ultra-high vacuum ion beam sputtering[J].Materials science & engineering, C. Biomimetic and supramolecular systems,2005(5/8):752-755. |
| [5] | Belashcbenko KD;Tsymbal E Y .Positive spin polarizatienin Co/Al2O3/Co tunnel junctions driven byoxygen adsorption[J].Phy Bey B,2005,71:224422-224428. |
| [6] | 沈海军,穆先才.纳米薄膜的分类、特性、制备方法与应用[J].微纳电子技术,2005(11):506-510. |
| [7] | 刘金生.离子束沉积薄膜技术及应用[M].北京:国防工业出版社,2003 |
| [8] | H. Kaiju;M. Nishiyama;Y. Otaka .Aluminum thickness dependence of resistance change in spin tunneling junctions Co Al-oxide Co[J].Journal of Magnetism and Magnetic Materials,2006(1):161-165. |
| [9] | S. Kundu .Mass dependent surface interface modification of Ag/Co films under controlled ion beam irradiation[J].Nuclear Instruments and Methods in Physics Research, Section B. Beam Interactions with Materials and Atoms,2006(1/2):542-545. |
| [10] | H. Kubota;T. Watabe;T. Miyazaki .Tunnel magnetoresistance in Ni_(80)Fe_(20)/Al_(2)O_(3)/Co/Al_(2)O_(3)/Co junctions[J].Journal of Magnetism and Magnetic Materials,1999(0):173-175. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%