采用微波等离子体增强化学气相沉积(MPECVD)法,在涂有FeCl3的硅衬底上制备出了纳米非晶碳薄膜.通 过SEM、XRD和拉曼光谱分析了薄膜材料的形貌和结构.并研究了薄膜材料的场发射特性.结果表明:薄膜的开启电场仅为0.39 V/μm;当电场强度为1.85 V/μm时,电流密度高达3.06 mA/cm2；且场发射点均匀、密集、稳定.迭代法计算表明薄膜材料的功函数为3.1 eV,发射点密度约为1.7×105个/cm2.这些均表明该薄膜是一种性能优良的场发射阴极材料.
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