金属电沉积的循环伏安(CV)曲线上的成核环可以用于分析添加剂对电沉积的影响及其作用机理.以常用的3种酸性镀铜添加剂为例,探讨了不同添加剂下成核环的形成特点,并从其成核环的位置以及构成成核环的电流曲线来探讨添加剂对铜沉积的影响及其机理.结果表明:当成核环分别位于不加添加剂的阴极电位和阳极电位方向时,添加剂对金属电沉积分别具有阻化和促进作用;阴极扫描方向电流密度Jb和回扫的阳极电流密度Ja是CV曲线成核环的两个特征参数,添加剂作用下的Ja和Jb与不加添加剂的接近,表明添加剂通过吸附-脱附机理影响金属的沉积,反之表明添加剂在电极表面参与化学反应.
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