本文运用均匀实验设计,研究各工艺参数(原料比,球磨时间,保温时间,煅烧温度等)对固相法制备Bi<,4>Si<,3>O<,12>粉体的影响.通过均匀实验数据直观分析,可以初步确定煅烧温度为800-850℃,氧化铋的挥发量可以忽略.并进行SPSS数据处理可知.煅烧温度对杂相数目的影响显著,其余因素为不显著.最终确定最佳纯度的Bi<,4>Si<,3>O<,12>粉体制备工艺参数:Bi<,2>O<,3>:SiO<,2>(mol%)为1:1.5,球磨时间为5 h,煅烧温度为830℃,保温时间3 h.
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