本文利用二维数值模拟方法,模拟分析了不同工作温度时绝缘层上应变SiGe沟道p-MOSFET的输出特性和亚阈值特性.结果表明:随着器件工作温度的不断提高,漏源饱和电流单调减小；亚阈值电流略有增大；亚阈值摆幅的改变量ΔS与温度基本上成线性关系；阈值电压不断地向正方向偏移.通过考虑自热效应的影响,不同Ge组分器件的漏源饱和电流均有不同程度的降低,且随着Ge组分的增加,漏源饱和电流的降低幅度增大.
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