探讨了热处理和热循环对空心阴极离子镀(HCD)法在玻璃基板上制备的Ni-49.12%Ti形状记忆合金薄膜的影响.结果表明,由于镀膜时基板温度较高,所得的膜已部分晶化,其组织为母相组织.经热处理后,其组织发生一系列变化.随加热温度的升高和保温时间的延长,其晶化程度变好,晶粒变粗大,并伴随产生R相、马氏体相和Ni3Ti,同时其相变温度也随之有所提高,但是当加热温度过高和保温时间过长,样品中各相的量减少,其衍射强度降低.薄膜经热循环后,其相变温度也发生变化.随着热循环次数增加,As和Af点逐渐升高,Ms点有所降低,tR基本保持不变.还发现薄膜经热处理后,其表面晶化程度不及内层.
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