掺硼金刚石薄膜具有负电子亲和势和良好的电子运输性能且容易制备,作为冷阴极材料在图像显示技术和真空技术等方面都有着巨大的应用价值,引起人们的注意.从二次电子发射的机理以及影响二次电子发射系数的因素等方面,对如何利用MPCVD法制备出高二次电子发射系数的掺硼金刚石薄膜进行了综述.论述表明通过合适的工艺条件,对薄膜表面进行适当的处理,是可以制备出高二次电子发射系数的阴极用金刚石薄膜的.
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