用磁控溅射方法制备了含Ti 4at%,18at%,27at%的非晶碳膜.用XPS分析了含Ti 18at%碳膜的碳键结构、化合物组成.结果发现:碳膜的C1s峰在284 eV附近,碳膜中sp2:sp3=14.6:6.3,sp2占明显优势,碳键结构以sp2为主;Ti2p谱的455.2 eV处的峰对应TiC,说明形成了TiC.用XRD对含Ti 4at%,18at%.27at%碳膜进行物相分析.结果发现:含Ti 18at%和27at%时,都存在TIC(111),TiC(200)和TiC(220)晶向,但27at%的Ti(111)取向更加明显;4at%时,没有发现TiC相.TEM的分析结果证明,含Ti 18at%的碳膜在非晶的基体上分布有TiC的颗粒.四点探针法(FPM)测定3种非晶碳膜的电阻率分布在9X 10-5～2X 10-4Ω.m之间,随着Ti含量的增加,电阻率减小.可以认定:磁控溅射制备的碳膜是碳键结构以sp2为主的非晶碳膜,加入一定量Ti后,在非晶的基体上形成Ti化合物的晶体颗粒.
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