采用磁控溅射方法制备NiFe/FeMn双层膜(分别以Ta、Cu作为缓冲层,Ta作为保护层).实验发现,以Ta为缓冲层的NiFe/FeMn双层膜的交换偏置场比以Cu为缓冲层的NiFe/FeMn双层膜的交换偏置场大,而矫顽力却很小.我们从织构、界面粗糙度两方面对其中的原因进行了分析.以Ta为缓冲层的NiFe/FeMn双层膜有好的织构且NiFe/FeMn界面较平滑,这引起了较强的交换偏置场和较低的矫顽力.
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