用第一原理法对Ge/Si (113)表面的重构、表面能和表面应力及其随Ge沉积层数的变化情况进行了计算,分析了Ge/Si (001)自组织量子点DOME形成机制和稳定性.发现构成DOME的Ge/Si(113)表面在压应变条件下是能量非常低的稳定表面.Ge原子在Si(001)表面上自组织生长量子点时,首先形成HUT岛;当生长到相当于约4个(001)层厚时,Ge/Si (113)表面表现为(2×2)-TPI&R重构,并开始形成稳定的DOME岛.
Using a first-principles total energy method based on density functional theory within local density approximation, we performed a first-principles computational calculation on reconstruction, energy and stress of Ge/Si(113) surface and their dependence on number of Ge layers deposited. We analyzed the formation mechanism and stability of DOME and found that Ge/Si(113) surface of DOME was a stable surface with lower energy under the compressive strain condition and DOME started to form when self-organized quantum dot on Si(001) grew to about four (001) layers' thickness.
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