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在其他加工参数固定的条件下,对Ld_(10)铝合金试件进行处理,然后采用扫描电镜对膜层表面显微结构进行观测分析,研究由KOH、KF、Na_2SiO_3、(NaPO_3)_6构成的溶液中各种成分浓度的变化对膜层表面放电孔径的影响.结果表明:KOH浓度变化对膜层孔径影响最小;随着Na_2SiO_3浓度的增加,膜层放电孔径先减小后快速增加;而增加KF和(NaPO_3)_6的浓度时,膜层孔径都会逐渐减小,最后趋向一个最小值.实验表明:调整好上述溶液的配比,可在试样表面获得最小放电孔径为350 nm的微弧氧化膜层.

Under other constant processing parameters condition, Ld_(10) aluminum alloys were treated and then the scanning electron microscope was used to observe the microstructure of the coating surface; finally the influence of each kind of solution composition on the electric discharge aperture in solution which consists of KOH, Na_2SiO_3, KF and (NaPO_3)_6 were researched. The result indicates that the change of KOH concentration has the smallest influence on the discharge aperture. With increasing the Na_2SiO_3 concentration, the discharge aperture decreases firstly, and then increases fast. When the concentration of the KF and (NaPO_3)_6 is increasing, the discharge aperture continues to reduce. After reaching a certain value, their influence on the discharge aperture is very small. Adjusting the above solution proportion, the microarc oxidation coating can be obtained whose smallest discharge aperture is 350 nm.

参考文献

[1] Barik RC;Wharton JA;Wood RJK;Stokes KR;Jones RL .Corrosion, erosion and erosion-corrosion performance of plasma electrolytic oxidation (PEO) deposited Al2O3 coatings[J].Surface & Coatings Technology,2005(2/3):158-167.
[2] Butyagin P I;Khokhryakov Ye V;Mamaev A I .[J].Materials Letters,2003,57:1748.
[3] Lukiyanchuk I V;Rudnev V S;Kuryavyi V G et al.[J].Thin Solid Films,2004,446:54.
[4] Jaspard-Mécuson F;Czerwiec T;Henrion G.[J].Surface and Coatings Technology,2006(01):6.
[5] 郑宏晔,王永康,李炳生,韩高荣.铝合金微弧氧化表面陶瓷膜的制备[J].材料保护,2004(02):19-21.
[6] 薛文斌,王超,陈如意,杜建成,张通和,李永良.Al-Si合金微弧氧化膜结构和成分表征[J].北京师范大学学报(自然科学版),2003(05):618-622.
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