通过直流平衡磁控溅射法在NiTi形状记忆合金基底上制备纯Zr膜,并采用SEM、XRD、XPS等对Zr膜的组织结构进行研究.结果表明:Zr膜具有晶带T型结构,组织保持细小致密的纤维状特征,没有空洞和锥状形态,表面平整,与基体结合良好;膜和其块体Zr靶材晶体结构一致,出现少量的生物惰性ZrO2陶瓷相.最后,对磁控溅射沉积Zr膜的机制进行了探讨.
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