采用自主研制的具有基底温度开-闭环复合自动控制系统的直流弧光放电PCVD设备，当开环流量不同时，在硬质合金基体表面分别进行了纳米金刚石薄膜制备研究。并采用SEM、XRD、激光Raman光谱仪对所制备薄膜的形貌、物相和品质进行了分析。研究结果表明，当开环流量从10→5→15→20mL／min变化时，所制备纳米金刚石薄膜的表面粗糙度及石墨成分会随之增加，金刚石晶粒转变为以（110）面生长为主，且尺寸增大；并加剧了硬质合金基体中Co相粘结剂向基体表面的扩散。温控中基底温度的波动（稳定性）是影响纳米金刚石薄膜生长性能的主要原因。
The nanocrystallite diamond films had been deposited on cemented carbide tool surtace by a novel home-made DC arc discharge plasma CVD device with the substrate temperature opened and closed loop composite control system under different cooling water flow. The morphology, texture, phase and quality of diamond films was characterized by scanning electron microscopy, X-ray diffraction and laser Raman spectroscopy. The results indicated that as the cooling water flow change from 10→5→15→20mL/min, the surface roughness, graphite phase and (110) faceted microcrystallite grains size of the nanocrystallite diamond films increases gradually with altering cooling water flow, while leading to cobalt phase diffusion from inside to surface of the cemented carbide substrate. The substrate temperature real-time altering under opened and closed loop composite control with different cooling water flow was the main factor affecting the nanocrystallite diamond film growth and quality.
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