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目的：获得具有高硬度、高韧性的 ZrAlN 薄膜。方法采用磁控溅射技术在钛合金和单晶 Si 上沉积不同 Al 含量的 ZrAlN 薄膜,对薄膜的微观组织和相结构进行表征,并测试薄膜的硬度(H)、弹性模量(E)和断裂韧性(K IC )。结果当 Zr1-x Alx N 薄膜 x 分别为0.05,0.23,0.47,0.63时,对应的硬度依次为24.5,40.1,17.1,19.1 GPa,断裂韧性依次为1.47,3.17,1.13,1.58 MPa·m-0.5。 x 为0.05和0.23时,Al 固溶到 ZrN 晶粒中,形成 NaCl 型面心立方(FCC)结构；x 为0.47和0.63时,则形成纤锌矿密排六方(HCP)AlN 第二相。结论 ZrAlN 薄膜的硬度和韧性与相组成密切相关。 Al 固溶时,ZrAlN 的硬度较高,韧性较好；超过固溶极限,形成六方 AlN 时,ZrAlN 硬度较低,韧性较差。相比之下,Zr0.77 Al0.23 N 薄膜同时具备最高的硬度和最高的韧性。

Objective To deposit ZrAlN coating with high hardness and good toughness. Methods ZrAlN thin films containing variable amounts of aluminum were deposited onto TC6 and Si wafers by magnetron sputtering Zr and Al target in an argon/ nitrogen gas mixture. The microstructure and mechanical properties were characterized. The hardness (H), modulus of elasticity (E) and fracture toughness (KIC ) of the film were tested. Results When the x of Zr1-x Alx N films was 0. 05,0. 23,0. 47,0. 63, the corre-sponding hardness values were 24. 5, 40. 1, 17. 1, 19. 1 GPa, and the fracture toughness values were 1. 47, 3. 17, 1. 13, 1. 58 MPa·m-0. 5 . When x was 0. 05 and 0. 23, Al was dissolved in ZrN grains, forming NaCl face centered cubic structure. When x was 0. 47 and 0. 63, wurtzite HCP AlN second phase was formed. Conclusion The hardness and toughness of ZrAlN film were closely related with the phase structure. When Al was dissolved in ZrAlN, the hardness and toughness of ZrAlN were relatively high. When the solubility limit was exceeded, HCP AlN was formed, the hardness and toughness of ZrAlN were relatively low. In contrast, Zr0. 77 Al0. 23 N had the highest hardness and toughness.