用射频反应磁控溅射方法制备了MeNx(Me=Ti、Zr、Hf)薄膜,研究了在富N2条件下不同的N2/Ar流量比对薄膜结构和光学性能的影响.掠角X射线衍射的分析结果表明,所制得的富氮的TiNx薄膜主要由TiN所组成,而富氮的ZrNx、HfNx薄膜则具有非晶态的结构.用分光光度计和傅里叶红外仪对薄膜的光学透过率的测试表明,TiNx薄膜在可见光及红外波段基本上是不透的,而ZrNx、HfNx薄膜在相应的波长范围,特别是在红外波段则有较高的光学透过率.比较不同N:/Ar流量比条件下制备的MeNx(Me=Zr、Hf)薄膜发现,ZrNx、HfNx两种薄膜的结构和光学性能没有发生显著的变化.最后,在ZnS衬底上制备的HfNx膜,在不降低ZnS的光学透过率的情况下,显著地提高了ZnS的表面硬度.因此,HfNx薄膜有望成为红外光学窗口的一种新的保护膜材料.
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