通过分析纳米孔的透射电子显微镜(TEM)截面图像和蒙特卡罗理论模拟,研究了聚焦离子束(FIB)研磨Au-Ti-GaAs薄膜的基本性能.应用蒙特卡罗方法模拟FIB研磨三层薄膜的损伤深度与离子能量大小的关系,由于材料不同的阻止本领和晶体结构等因素对损伤深度的影响,随着离子能量的增大,损伤深度并非线性增加.同时,溅射物质的重沉积也影响着纳米孔的形貌,对此也作了系统的分析和探讨.
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