纳米球刻蚀技术

功能材料, 2005, 36(9): 1312-1315.

纳米球刻蚀技术

钟智勇 ^1, , 刘爽 ^2, , 赵文多 ^3, , 李敏姬 ^4, , 张怀武 ^5,

1.电子科技大学,微电子与固体电子学院,四川,成都,610054

2.电子科技大学光电信息学院,四川,成都,610054

3.电子科技大学,微电子与固体电子学院,四川,成都,610054

4.电子科技大学,微电子与固体电子学院,四川,成都,610054

5.电子科技大学,微电子与固体电子学院,四川,成都,610054

基金项目: 国家自然科学基金(60490290)

关键词：纳米球刻蚀 , 纳米阵列 , 纳米加工

Nanosphere lithography technique

纳米球刻蚀技术是一种并行的制备纳米点阵的自组装方法,其核心是二维有序纳米胶体球阵列掩膜的制备.本文详细介绍了二维有序纳米胶体球阵列掩膜的各种自组装合成原理与方法,分析了各种工艺参数的纳米阵列的影响.最后,综述了纳米球刻蚀技术的发展状况与趋势.

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纳米球刻蚀技术

Nanosphere lithography technique

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