用CH4、NH3和H2为反应气体,利用等离子体增强热丝化学气相沉积系统在沉积有碳膜的Si衬底上制备了碳尖端.利用原子力显微镜和显微Raman光谱仪对沉积的碳膜表征的结果表明碳膜是非晶碳膜,并且粗糙不平.用扫描电子显微镜对碳尖端表征的结果表明碳尖端的形貌与偏压电流有关,即随着偏压电流的增大,碳尖端的顶角减小,高度增大.由于在碳尖端形成的过程中,既有离子的沉积又有离子的溅射,结合有关等离子沉积和溅射的理论,建立了碳尖端的形成模型,并根据模型分析了实验结果.
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