采用热蒸发法在氧化铟锡玻璃上制备三氧化钼(MoO3)纳米带薄膜.通过扫描电镜、X射线衍射、红外光谱分析了纳米带的表面形貌及结构,通过紫外-可见-近红外光谱以及光致发光谱分析了电致变色前后纳米带光学性能以及缺陷分布情况.结果表明:纳米带的光学带隙为3.36 eV,变色前纳米带内部就存在着部分由晶格畸变和氧空位产生的+5价Mo离子；变色后,注入的Li+和e-使材料内部的[MoO6]八面体发生新的畸变,产生新的Mo5.电子在+6价和+5价的Mo离子间发生迁移而导致着色.
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