采用等离子体沉积技术在医用NiTi合金表面制备非晶SiOx:H纳米膜层,并对改性后材料表面化学及膜层晶体结构等进行表征.结果表明,通过控制TMS和O2两种单体流速比和沉积时间,可控制材料表面亲疏水性和SiOx:H纳米膜层厚度.反应沉积的SiOx:H具有非晶的结构.其最优化条件为;μ(TMS):μ(O2)=1:4,系统压力3.33Pa,D.C 5W,沉积时间4min.所制备的膜层厚度约为45nm,表面去离子水接触角为30～40°.SiOx:H纳米膜层改性NiTi合金表面可提高材料的抗腐蚀性能.
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