以MPCVD法合成金刚石薄膜的实验结果为基础，深入分析了微波等离子体性质对金刚石薄膜沉积过程的影响，提出了解释金刚石薄膜不均匀沉积现象的新机理，即由微波等离子体中电子浓度的不均匀分布引起反应气相中过饱和原子氢浓度的不均匀分布所致
Based on the experimental results of depositing diamond film by MPCVDmethod, the effect of the characteristics of microwave induced plasma on the process of diamond deposition is thoroughly analysed. A new mechanism causing nonuniform diamonddeposition had been put forward, which considers the main factor to be the nonuniform distribution of supersaturated atomic hydrogen resulted from the nonuniform distribution ofelectrons in microwave induced plasma.
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