铁电薄膜材料是目前国际上研究的热点之一.综述了铁电薄膜及其制备技术研究的新进展,介绍铁电薄膜材料的性能及应用,并重点分析了铁电薄膜不同制备技术的优缺点,指出了目前关于铁电薄膜研究中的一些重要问题.
参考文献
| [1] | Koinuma H;Kanda N et al.[J].Surface Science Applications,1997,109(110):514. |
| [2] | Kaigawa K.;Imaeda M.;Sakai H.;Fukuda T.;Kawaguchi T. .Crystal structure of LPE-grown LiNb1-xTaxO3 epitaxial films[J].Journal of Crystal Growth,1998(1/2):119-124. |
| [3] | Araujo C A;Cuchiaro J D et al.[J].NATURE,1995,374:627. |
| [4] | Park B H;Kang B S et al.[J].Nature,1999,401:682. |
| [5] | Chon U;Jang H M;Kim M G et al.[J].Physical Review Letters,2002,89(08):87601. |
| [6] | Hou F;Shen M R;Cao W W .[J].Thin Solid Films,2005,471:35. |
| [7] | Idemoto Y;Yokoyama N et al.[J].Journal of the Ceramic Society of Japan,2004,112:669. |
| [8] | Zhong XL;Wang JB;Zheng XJ;Zhou YC;Yang GW .Structure evolution and ferroelectric and dielectric properties of Bi3.5Nd0.5Ti3O12 thin films under a moderate temperature annealing[J].Applied physics letters,2004(23):5661-5663. |
| [9] | Jeon M K;Woo S I;Kim Y I .[J].Journal of the Korean Physical Society,2004,45:1240. |
| [10] | Seo B I;Park N J;Kim S J .[J].Journal of the Korean Physical Society,2004,45:1313. |
| [11] | Park B E;Takahashi K et al.[J].Applied Physics Letters,2004,85:4448. |
| [12] | Li W;Chen K;Yao YY .[J].Applied Physics Letters,2004,85:4717. |
| [13] | Aueieilo O;Gifford K D et al.[J].Applied Physics Letters,1994,64:2873. |
| [14] | 张福学;王丽坤.现代压电学[M].北京:科学出版社,2002:221. |
| [15] | Ramakrishan E S;Howng W .[J].Journal of Vacuum Science and Technology,1992,10A:69. |
| [16] | Adachi M;Matusuzaki T;Yomada T et al.[J].Japanese Journal of Applied Physics,1987,26:550. |
| [17] | Blossfeld L;Warren W L et al.[J].真空,1990,41:1428. |
| [18] | Mitsuya M.;Osada M.;Saito K.;Funakubo H. .Preparation of SrBi2(Ta0.7Nb0.3)(2)O-9-Bi3TaTiO9 solid solution films by MOCVD and their properties[J].Journal of Crystal Growth,2002(Pt.1):473-477. |
| [19] | Roeder J F;Hendrix B C;Hintermaier F et al.[J].Journal of the European Ceramic Society,1999,19:1463. |
| [20] | Shimizu M.;Fujisawa H.;Niu H.;Honda K. .Growth of ferroelectric PbZrxTi1-xO3 thin films by metalorganic chemical vapor deposition (MOCVD)[J].Journal of Crystal Growth,2002(Pt.1):448-454. |
| [21] | Fujisawa H.;Nonomura H.;Shimizu M.;Niu H. .Observations of initial growth stage of epitaxial Pb(Zr,Ti)O-3 thin films on SrTiO3(100) substrate by MOCVD[J].Journal of Crystal Growth,2002(Pt.1):459-463. |
| [22] | Shin DS.;Kim YT.;Choi IH.;Choi HS. .SrBi2Ta2O9 thin films grown by MOCVD using a novel double metal alkoxide precursor[J].Journal of Crystal Growth,2000(4):1009-1012. |
| [23] | Tejedor P;Fernandez A B;Jimenez R et al.[J].Microelectronics Reliability,2000,40:683. |
| [24] | Song Z T;Chan H L W;Choy C L .[J].Microelectronic Engineering,2003,66:887. |
| [25] | Tejedor P.;Barrena E.;Jimenez R.;Alemany C.;Mendiola J.;Ocal C. .Composition-related effects of microstructure on the ferroelectric behavior of SBT thin films[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2001(0):759-763. |
| [26] | Kwon Y T;Lee I M;Lee W I et al.[J].Materials Research Bulletin,1999,34:749. |
| [27] | Sik K W;Ha S K;Park H H et al.[J].Thin Solid Films,1999,355-356:531. |
| [28] | Li AD.;Mak CL.;Wong KH.;Shao QY.;Wang YJ.;Wu D.;Ming NB. .Thickness-dependent structural characteristics of sol-gel-derived epitaxial (PbZr)TiO3 films using inorganic zirconium salt[J].Journal of Crystal Growth,2002(1/4):307-312. |
| [29] | Wang H;Yu Jun;Dong X M;Zhou W et al.[J].Japanese Journal of Applied Physics,2001,40(3A):90. |
| [30] | Zhang J;Cui D F;Lu H B et al.[J].Japanese Journal of Applied Physics,1997,36:276. |
| [31] | Hu W S;Liu Z G;Feng D .[J].Journal of Applied Physics,1996,80:7689. |
| [32] | Kim DW.;Lee SH.;Noh TW.;Oh SM. .Structural and optical properties of LiNbO3 films grown by pulsed laser deposition with a shadow mask[J].Japanese journal of applied physics,1998(4A):2016-2020. |
| [33] | Warren W L;Dimos D;Waser R M .[J].MRS Bulletin,1996,40:1996. |
| [34] | Scott J F;Paz de Araujo C A .[J].科学(上海),1989,246:1400. |
| [35] | Vijay D P;Desu S B .[J].Journal of the Electrochemical Society,1993,140:2640. |
| [36] | Lee JJ.;Desu SB.;Thio CL. .ELECTRODE CONTACTS ON FERROELECTRIC PB(ZRXTI1-X)O-3 AND SRBI2TA2O9 THIN FILMS AND THEIR INFLUENCE ON FATIGUE PROPERTIES[J].Journal of Applied Physics,1995(8):5073-5078. |
| [37] | Li R C .[J].Journal of Materials Science,1998,33:1783. |
| [38] | Haertling G H .[J].Integrated Ferroelectrics,1997,14:219. |
| [39] | Griswold E M;Sayer M;Amm D T et al.[J].Canadian journal of physics,1991,69:260. |
| [40] | Aoki K;Fukuda Y .[J].Japanese Journal of Applied Physics,1997,36:1195. |
| [41] | 陈志武,程璇,张颖.铁电薄膜电疲劳研究进展[J].功能材料,2003(05):500-504. |
| [42] | Al-Shareef H N;Dimos D;Boyle T J et al.[J].Applied Physics Letters,1996,68:690. |
| [43] | Dimos D;Warren W L et al.[J].Journal of Applied Physics,1994,76:4305. |
| [44] | Waser R;Baiatu T;Hardtl K H .[J].Journal of the American Ceramic Society,1990,73:1645. |
| [45] | Xiao D Q;Meng L L .[J].Ferroelectrics Letters,2002,29(5-6):95. |
| [46] | Guo X L;Liu Z G;Chen X Y et al.[J].Journal of Physics D:Applied Physics,1996,29(01) |
| [47] | Ramesh R;Lee J;Sands T et al.[J].Applied Physics Letters,1994,64:2511. |
| [48] | Mathews S;Ramesh R et al.[J].科学(上海),1997,276:238. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%