采用磁控溅射工艺,在玻璃基片上制备了Zn1-xCoxO(x=0.02～.015)稀磁半导体薄膜.采用X-射线衍射(XRD),X射线光电子能谱(XPS)、原子力显微镜(AFM)、振动样品磁强计(VSM)研究了薄膜的相结构、化学成分及价态、表面形貌和磁性能.结果表明,本实验条件下,薄膜不存在Co及Co的氧化物相,薄膜中Zn的化学价为+2,Co则以+2和+4价的形式存在;薄膜晶体结构为c轴取向生长的六方纤锌矿结构;薄膜表面平整致密.在温度为300 K时,Zn0.9Co0.1O薄膜呈铁磁效应,在M-H曲线中观测到明显的磁滞回线特征.
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