采用单、双靶反应磁控溅射法分别在45钢、GCr15钢、硅(100)和钼衬底上制备了AlN薄膜.X射线衍射和电子显微分析表明,双靶反应磁控溅射沉积的AlN薄膜具有高致密度和低残余应力,同时采用划痕法和压痕法等对AlN薄膜的粘结强度进行测试, 结果表明:双靶反应磁控溅射共沉积AlN薄膜的粘结强度明显比单靶沉积的薄膜高,划痕临界载荷提高0.5～2倍.不同衬底上沉积的AlN薄膜粘结强度存在很大的差别,以钼衬底上沉积的薄膜粘结强度最高,划痕法测得的临界载荷高达64 N;GCr15衬底上AlN薄膜摩擦试验表明,AlN薄膜能明显起到减磨作用.
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