SiC单晶生长是一个引人注目的研究热点,受到各国政府、科研人员的广泛关注.本文综述了SiC单晶生长的研究进展,对目前广泛采用的PVT法进行了详细介绍,讨论了原料、籽晶、温度、温度梯度、载体气压对单晶生长和质量的影响.对今后的研究方向提出了看法.
参考文献
[1] | Capano M A;Trew R J .[J].MRS Bulletin,1997,22(03):19. |
[2] | 郝跃;彭军;杨银堂.碳化硅宽带隙半导体技术[M].北京:科学出版社,2000 |
[3] | Muller St G;Glass R C;Hobgood H M et al.[J].Journal of Crystal Growth,2000,211:325. |
[4] | Acheson A G .[P].EnglPat17911,1892. |
[5] | Lely J A .[J].Bet Dtsch Keram Ges,1955,32:229. |
[6] | Yu M;Tairov Tsvetkov V F .[J].Journal of Crystal Growth,1978,43(02):209. |
[7] | Yu Karpov S;Makarov Yu N;Mokhov E N et al.[J].Journal of Crystal Growth,1997,173:408. |
[8] | Mokhov E N;Ramm M G;Roenkov A D et al.[J].Materials Science and Engineering,1997,B46:317. |
[9] | Tairov Yu M;Tsvetkov V F .[J].Journal of Crystal Growth,1978,43(02):209. |
[10] | Tairov Yu M;Tsvetkov V F .[J].Journal of Crystal Growth,1981,52(01):146. |
[11] | Jayatirtha H N;Spencer M G;Taylor C et al.[J].Journal of Crystal Growth,1997,174:662. |
[12] | Shields V B;Fakade K;Spencer M G .[J].Applied Physics Letters,1993,62:1919. |
[13] | Nishiguchi T;Okada S;Harima M et al.[J].Materials Science Forum,2000,338-342:115. |
[14] | Carter C H Jr;Tsvetkov V F;Glass R C.[J].Materials Science and Engineering,1999:1. |
[15] | 国家八六三计划项目验收报告:碳化硅单晶与薄膜半导体材料[R].中国科学院上海硅酸盐研究所,2000. |
[16] | Selder M.;Makarov Y.;Durst F.;Wellmann P.;Straubinger T. Hofmann D.;Karpov S.;Ramm M.;Kadinski L. .Global numerical simulation of heat and mass transfer for SiC bulk crystal growth by PVT[J].Journal of Crystal Growth,2000(1/4):333-338. |
[17] | Jun Takahashi;Yuichiro Fujiwara;Masatoshi Kanaya .[J].Journal of Crystal Growth,1994,135:61. |
[18] | Stein R A;Lanig P .[J].Journal of Crystal Growth,1993,131:71. |
[19] | Barrett D L;Seidensticker R G;Gaida W et al.[J].Journal of Crystal Growth,1991,109:17. |
[20] | Ziegler G;Lanig P;Theis D et al.[J].IEEE Transactions on Electron Devices,ED-30(04):277. |
[21] | Gary L Harris.Properties of Silicon Carbide[M].London:INSPEC,1995:170. |
[22] | Karpov S Yu;Kulik A V;Zhmakin I A et al.[J].Journal of Crystal Growth,2000,211:347. |
[23] | Vodakov Yu A;Roenkov A D;Ramm M G et al.[J].Physica Status Solidi B,1997,202:177. |
[24] | Nishino S.;Tanaka T.;Saraie J.;Higashino T. .GROWTH MECHANISM AND DEFECTS IN SIC PREPARED BY SUBLIMATION METHOD[J].Journal of Crystal Growth,1995(3/4):339-342. |
[25] | Camassel J;Juillaguet S;Planes N.[J].Materials Science and Engineering,1999:258. |
[26] | Augustine G.;Brandt CD.;Balakrishna V. .Growth and characterization of high-purity SiC single crystals[J].Journal of Crystal Growth,2000(1/4):339-342. |
[27] | Grosse P;Basset G;Calvat C.[J].Materials Science and Engineering,1999:58. |
[28] | Drowart J;De Maria G;Inghram M G .[J].Journal of Chemical Physics,1958,29(05):1015. |
[29] | Glass RC.;Tsvetkov VF.;Carter CH.;Henshall D. .SIC SEEDED CRYSTAL GROWTH[J].Physica status solidi, B. Basic research,1997(1):149-162. |
[30] | Dorozhkin S I;Avrov D D;Rastegaev V P et al.[J].Materials Science and Engineering,1997,B46:296. |
[31] | Schulz D.;Dolle J.;Irmscher K.;Muller T.;Rost HJ.;Siche D. Wollweber J.;Wagner G. .Impurity incorporation during sublimation growth of 6H bulk SiC[J].Journal of Crystal Growth,1999(Pt.2):1024-1027. |
[32] | Avrov DD.;Dorozhkin SI.;Rastegaev VP.;Tairov YM.;Bakin AS. .The analysis of mass transfer in system beta-SiC-alpha-SiC under silicon carbide sublimation growth[J].Journal of Crystal Growth,1999(Pt.2):1011-1014. |
[33] | Tairov Yu M;Tsvetkov V F .Progress in Crystal Growth and Characterization[J].,1983,7:11. |
[34] | Anikin M;Mader R .[J].Materials Science and Engineering,1997,B46:278. |
[35] | Augustine G.;Balakrishna V.;Dunne G.;Hopkins RH.;Hobgood HM. .PHYSICAL VAPOR TRANSPORT GROWTH AND PROPERTIES OF SIC MONOCRYSTALS OF 4H POLYTYPE[J].Physica status solidi, B. Basic research,1997(1):137-148. |
[36] | Kanaya M et al.[J].Applied Physics Letters,1991,58:56. |
[37] | Kimoto T et al.[Q].ibid,1995,66:45. |
[38] | Takahashi J;Kanaya M;Fujiwara Y .[J].Journal of Crystal Growth,1994,135:61. |
[39] | akahashi J;Ohtani N;Kanaya M .[J].Journal of Crystal Growth,1996,167:596. |
[40] | Takahashi J.;Katsuno M.;Shinoyama S.;Ohtani N. .SUBLIMATION GROWTH OF 6H- AND 4H-SIC SINGLE CRYSTALS IN THE [1(1)OVER-BAR-00] AND [11(2)OVER-BAR-0] DIRECTIONS[J].Journal of Crystal Growth,1997(3):229-240. |
[41] | Takahashi J;Ohtani N;Kanaya M .[J].Japanese Journal of Applied Physics,1995,34:4694. |
[42] | Rost H-J;Siche D;Dolle J.[J].Materials Science and Engineering,1999:68. |
[43] | Schulz D;Wagner G;Doerschel J.[J].Materials Science and Engineering,1999:86. |
[44] | Glass R C;Henshall D;Tsvetkov V F et al.[J].MRS Bulletin,1997,22(03):30. |
[45] | Ho{mann D;Bickermann M;Eckstein R.[J].Journal of Crystal Growth,1999:1005. |
[46] | Karo T;Oyanagi N;Yamaguchi H et al.[J].Journal of Crystal Growth,2001,222:579. |
[47] | Maltsev A A;Maksimov A Yu;Yushin N K .[J].INSTITUTE OF PHYSICS CONFERENCE SERIES,1996,142:41. |
[48] | Heydemann V D;Schulze N;Barrett D L et al.[J].Applied Physics Letters,1996,69(24):3728. |
[49] | Garcon I;Rouault A;Anikin M et al.[J].Materials Science and Engineering,1995,B29:90. |
[50] | Nishino S.;Tanaka T.;Saraie J.;Higashino T. .GROWTH MECHANISM AND DEFECTS IN SIC PREPARED BY SUBLIMATION METHOD[J].Journal of Crystal Growth,1995(3/4):339-342. |
[51] | Knippenberg W F .[J].Philips Research Reports,1963,18:161. |
[52] | Chourou K;Anikin M;Bluet J M.[J].Materials Science and Engineering,1999:82. |
[53] | Schulze N;Barrett D L;Pensl G .[J].Pensl Appl Phys Lett,1998,72(13):1632. |
[54] | Segal A S;Vorob'ev A N;Karpov S Yu.[J].Materials Science and Engineering,1999:40. |
[55] | Yakimova R;Syvajrvi M;Tuominen M.[J].Materials Science and Engineering,1999:54. |
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