采用磁控溅射法在Si基片上沉积非晶态Ta-C-N薄膜.利用纳米压痕仪表征其纳米硬度和弹性模量；摩擦磨损实验检测其摩擦学性能；光学轮廓仪和扫描电镜观察磨痕形貌.结果表明:Ta-C-N薄膜具有较高的纳米硬度9.45 GPa和弹性模量225.71 GPa,同时具有较低的摩擦系数0.238,磨损率5.94×10-6mm3 ·N-1·m-1,磨面较为平整光滑,体现了优越的摩擦磨损性能.
参考文献
| [1] | 王广甫,张荟星.FCVAD合成Ta-C（N）薄膜及其Raman和XPS分析[J].发光学报,2003(05):535-539. |
| [2] | ZHANG Hua-yu,张化宇,刘良学,马洪涛,刘凡新,刘会良,王东.不同工艺制备的ta-C和ta-C：N薄膜表面粗糙度研究[J].材料科学与工程学报,2006(05):673-675. |
| [3] | Shui Jinn Wang;Hao Yi Tsai;S.C. Sun;M.H. Shiao .Characterization of Sputtered Ta-C-N Film in the Cu/barrier/Si Contact System[J].Journal of Electronic Materials,2001(8):917-924. |
| [4] | Wojcik H;Friedemann M;Feustel F.A comparative study of thermal and plasma enhanced ALD Ta-N-C films on SiO2,SiCOH and Cu substrates[A].IEEE,2007:19-21. |
| [5] | Kim S H;Im S J;Kim K B .The effect of ion beam bombardment on the properties of Ta (C) N films deposited from pentakis-diethylamidotantalum[J].Thin Solid Films,2002,415(1-2):177-186. |
| [6] | Ohshita Y.;Hoshino A.;Hiiro S.;Machida H.;Ogura A. .Low-pressure chemical vapor deposition of TaCN films by pyrolysis of ethylamido-tantalum[J].Journal of Crystal Growth,2000(4):604-609. |
| [7] | Engbrecht ER.;Sun YM.;Smith S.;Pfiefer K.;Bennett J.;White JM. Ekerdt JG. .Chemical vapor deposition growth and properties of TaCxNy[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(2):145-150. |
| [8] | 柳清亮,张伟,汪勇.非晶碳涂层的摩擦磨损性能研究[J].中国表面工程,2008(01):33-36. |
| [9] | Leyland A;Matthews A .On the significance of the H/E ratio in wear control:a nanocomposite coating approach to optimised tribological behaviour[J].Wear,2000,246(1-2):1-11. |
| [10] | 程广贵,丁建宁,凌智勇,坎标,范真,石超燕.纳米弹性复合DLC薄膜的制备及其摩擦性能研究[J].摩擦学学报,2008(03):207-212. |
| [11] | 张永宏,蒋百灵,刘艳.Cr含量对掺铬类石墨膜的力学和摩擦学性能的影响[J].西安理工大学学报,2009(04):394-399. |
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