介绍了用于制备薄膜材料的磁控溅射技术,总结了以改变磁场分布方式而得到的各类新型磁控溅射方式,如非平衡磁场(扩散性、内敛性、闭合场),扫描磁场,强度可变磁场,在基片、靶面或其他部位外加的磁场,高强度磁场等.
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