欢迎登录材料期刊网

材料期刊网

高级检索

铱优异的理化性能使其成为高温抗氧化防护领域最重要的涂层材料之一.对制备铱涂层的多种方法进行了比较和分析,在此基础上,介绍了熔盐电沉积法制备铱及其合金涂层的装置和沉积前处理,讨论了熔盐体系、温度、电流密度及波形、环境气氛等工艺参数对涂层制备的影响,总结了铱及其合金涂层的性能和应用,指出了尚需研究的若干关键问题.

参考文献

[1] Echigoya J;Mumtaz K;Hayasaka Y;Aoyagi E .Electron microscopic study of sputter-deposited Ir films[J].Journal of Materials Science,2004(20):6215-6219.
[2] Mumtaz K.;Enoki H.;Hirai T.;Shindo Y.;Echigoya J. .THERMAL CYCLING OF IRIDIUM COATINGS ON ISOTROPIC GRAPHITE[J].Journal of Materials Science,1995(2):465-472.
[3] 华云峰,陈照峰,张立同,成来飞.MOCVD Ir薄膜的制备与沉积效果分析[J].稀有金属材料与工程,2005(01):139-142.
[4] Khoa TD.;Horii S.;Horita S. .High deposition rate of epitaxial (100) iridium film on (100)YSZ/1 0 0)Si substrate by RF sputtering deposition[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1/2):88-94.
[5] Galeazzi M.;Chen C.;Cohn JL.;Gundersen JO. .Iridium thin films deposited via pulsed laser deposition for future applications as transition-edge sensors[J].Nuclear Instruments and Methods in Physics Research, Section A. Accelerators, Spectrometers, Detectors and Associated Equipment,2004(1/3):293-295.
[6] Pergolesi D.;Gatti F.;Gastalda L.;Gomes MR.;Dussoni S.;Valle R. Repetto P.;Marre D.;Bellingeri E. .Development of iridium TES by pulsed laser deposition with a Nd : YAG laser[J].Nuclear Instruments and Methods in Physics Research, Section A. Accelerators, Spectrometers, Detectors and Associated Equipment,2004(1/3):311-313.
[7] 吴王平,陈照峰,丛湘娜,王亮兵.难熔金属高温抗氧化铱涂层的研究进展[J].稀有金属材料与工程,2013(02):435-440.
[8] 华云峰,李争显,杜继红.炭/炭复合材料抗氧化抗热震铱涂层的研究进展[J].稀有金属材料与工程,2010(11):2059-2063.
[9] 张新,罗远辉,李兴彦.铱电镀工艺的简介与展望[J].金属功能材料,2012(02):58-61.
[10] Wu, W.;Chen, Z.;Lin, X.;Li, B.;Cong, X. .Effects of bias voltage and gas pressure on orientation and microstructure of iridium coating by double glow plasma[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2011(4):429-437.
[11] 胡昌义,李靖华,王云,万吉高,钱旭,高逸群,邓德国,尹志民.Ir薄膜的化学气相沉积制备及SEM研究[J].有色金属,2002(z1):33-36.
[12] 胡昌义,李靖华,高逸群,邓德国,尹志民.CVD在铱涂层和薄膜制备中的应用[J].贵金属,2002(01):53-56.
[13] Baumli, P;Kaptay, G .Wettability of carbon surfaces by pure molten alkali chlorides and their penetration into a porous graphite substrate[J].Materials Science and Engineering. A, Structural Materials: Properties, Microstructure and Processing,2008(1/2):192-196.
[14] 杨文彬,张立同,成来飞,华云峰,徐永东.MOCVD法制备多层Ir涂层的显微结构[J].固体火箭技术,2006(01):56-59.
[15] 朱利安,杨盛良,白书欣,张虹,万红.铱及其合金的加工及应用[J].贵金属,2009(04):58-62.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%