目的：探究铝合金在低浓度硫酸电解液中，阳极氧化膜的生长及特性。方法在3%H2 SO4和18%H2 SO4(均为质量分数)电解液中对6063铝合金进行硬质阳极氧化，通过对膜层生长过程中的电压-时间曲线及微观形貌进行分析，研究膜层的生长特性。结果在低浓度硫酸电解液中，氧化膜初期生长为“缺陷择优生长”方式，即在高表面能缺陷处不断形成氧化膜核心并铺展，直到相遇形成界面为止；后期生长为“交界面择优生长”方式，即在较薄氧化膜交界面不断溶蚀并产生Al3+和O2-反向传输，使氧化膜增厚。结论低浓度硫酸中阳极氧化膜的生长方式与传统阳极氧化膜显著不同，膜层更加致密，厚度、硬度和粗糙度较大。
Objective To study the growth and characteristics of hard anodic oxidization film with low sulfuric concentration for aluminum alloy. Methods The hard anodic oxidization of aluminum alloy 6063 was performed in the electrolyte with 3%H2 SO4 and 18% H2 SO4( mass fraction) , the voltage-time curve and microstructure in the film growth process were analyzed to study the charac-teristics of the growth of the films. Results In the electrolyte with low sulfuric concentration, the oxidation film grew to″Preferential Growing Mode for Oxidation Film″ at the initial stage. At the site of high surface energy defect, the oxidation film core formed con-tinuously and spread out until met and formed the interface;at later stage, the oxidation film grew to ″Preferential Growing Mode for Oxidation Film Interface″ and was eroded continuously on the thinner oxidation film interface to produce the reverse conveying of Al3+ and O2-, which thickened the oxidation film. Conclusion The growth manner of anodic oxidization film at low sulfuric concen-tration was obviously different from the traditional one. The film was denser and the thickness, hardness and roughness of the film were greater.
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