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Ni-Cr and Fe-Cr-Al films deposited on the Al2O3 substrate are studied by a method of vacuum evaporation in this paper. Influence of resistance value on density and evaporation parameters of the films reveals that the resistance of films and the adhesion of films to substrates are determined by the evaporation time and the substrate temperate under the condition of the maximum vacuity of 6.2×10-4 pa, respectively.

参考文献

[1] M B Tian;D.L.Liu.Handbook of Films Science & Technology[M].First Volume, Machinery Industry Publisher, Beijing,1991:1.
[2] B C Yang;W.X. Wang.Films Physics & Technology[M].成都:电子科技大学出版社,1994:17.
[3] J George.Preparation of Thin Films[M].Marcel Dekker Inc., New York,1992:1.
[4] X X Qu.Thin Films Physics[M].上海:上海科学技术出版社,1986:25.
[5] X X Qu;B.J. Guo.Thin Films Physics[M].北京:电子工业出版社,1994:56.
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