Diamond-like Carbon (DLC) films have been prepared on Si(100) substrates by arc ion plating in conjunction with pulse bias voltage under H2 atmosphere. The deposited films have been characterized by scanning electron microscopy and atomic force microscopy. The results show that the surface of the film is smooth and dense without any cracks, and the surface roughness is low. The bonding characteristic of the films has been studied by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. It shows the sp3 bond content of the film deposited at -200V is 26.7%. The hardness and elastic modulus of the film determined by nanoindentation technique are 30.8 and 250.1GPa, respectively. The tribological characteristic of the films reveals that they have low friction coefficient and good wear-resistance. After deposition, the films have been annealed in the range of 350-700℃ for 1h in vacuum to investigate the thermal stability. Raman spectra indicate that the ID/IG ratio and G peak position have few detectable changes below 500℃. Further increasing the annealing temperature, the hydrogen can be released, the structure rearranges, and the phase transition of sp3 configured carbon to sp2 configured carbon appears.
参考文献
[1] | M G Begih;A C Ferrari;K B K Teo;J.Robertson C.E.Bottani A.Libassi and B.K.Tanner.[J].Applied Physics Letters,2002:3804. |
[2] | J.Robertson.[J].Pure and Applied Chemistry,1994:1789. |
[3] | J.Robertson.[J].Surface and Coatings Technology:185. |
[4] | A.A.Voevodin;M.S.Donley.[J].Surface and Coatings Technology:199. |
[5] | Q.Wei;J.Narayan .Superhard Diamondlike carbon: preparation, theory, and properties[J].International Materials Reviews,2000(4):133-164. |
[6] | D H Kim;H E Kim;K R Lee;C N Whang and I S Lee.[J].Materials Science and Engineering C:9. |
[7] | A.Matthews;S.S.Eskildsen.[J].Diamond and Related Materials,1994:902. |
[8] | S Fujimaki;l I Matsumoto;Y Kokaku;M Kitoh and N Tsumita.[J].Journal of Vacuum Science and Technology A-Vacuum Surfaces and Films,1996:194. |
[9] | A A Onoprienko;V V Artamonov;I B Yanchuk.[J].Surface and Coatings Technology:189. |
[10] | J Robertson.[J].Materials Science and Engineering R:Reports:129. |
[11] | X Shi;B K Tay;H.S.Tan;Z.Li Y.Q.Tu S.R.P.Silva and W.I.Milne.[J].Journal of Applied Physics,1996:7234. |
[12] | J Schwan;S Ulrich;H.Roth;H.Ehrhardt S.R.P.Silva J.Robertson R.Samlenski and R.Brenn.[J].Journal of Applied Physics,1996:1416. |
[13] | M.Ban;T.Hasegawa;S.Fujii;J.Fujioka.[J].Diamond and Related Materials,2003:47. |
[14] | R.F.Huang;C.Y.Chan;C.H.Lee;J.Gong;K.H.Lai;C.S.Lee;K.Y.Li .Wear-resistant multilayered diamond-like carbondoating prepared by pulse biased arc ion plating[J].Diamond and Related Materials,2001(9/10):1850-1854. |
[15] | D S Knight;W B White.[J].Journal of Materials Research,1989:385. |
[16] | 邹友生,汪伟,郑静地,孙超,黄荣芳,闻立时.偏压对电弧离子镀沉积类金刚石膜的影响[J].金属学报,2004(05):537-540. |
[17] | P Mérel;M Tabbal;M Chaker;S Moisa and J Margot.[J].Applied Surface Science:105. |
[18] | T. Y. Leung;W. F. Man;S. K. So;P. K. Lim;W. C. Chan;F. Gaspari;S. Zukotynski .Photothermal deflection spectroscopy and transmission measurements of a-C:H films[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,1999(0):151-155. |
[19] | Y. Taki;O. Takai .XPS structural characterization of hydrogenated amorphous carbon thin films prepared by shielded arc ion plating[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1998(1/2):45-50. |
[20] | P.Lemoine;J.F.Zhao;J.P.Quinn;J.A.Mclaughlin and P.Maguire.[J].THIN SOLID FILMS,2000:166. |
[21] | X.X.Han;P.X.Yan;F.Y.Yan;W.M.Liu.[J].摩擦学学报,2003(01):5. |
[22] | R O Dillon;A Ali;N J Ianno;A Abmad and T Furtak.[J].Journal of Fac Sci Technol A:2826. |
[23] | C Wild;P Koidl.[J].Applied Physics Letters,1987:1506. |
[24] | D.R.Tallant;J.E.Parmeter;M.P.Siegal;R.L.Simpson.[J].Diamond and Related Materials,1995:191. |
- 下载量()
- 访问量()
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%