制备一种新型外科植入用钛合金Ti12.5Zr2.5Nb2.5Ta(TZNT),通过溶血试验、细胞毒性试验和皮下埋植试验系统评价该合金的生物相容性,并与3种标准外科植入用钛合金Ti6Al4V、Ti6Al7Nb以及TA2进行对比.该合金经完全退火工艺处理后(700 ℃,45 min,AC),主要由大量位向不同的片层状α相簇和少量位于α片间的β相组成.溶血试验结果表明:TZNT的溶血率为0.683%(远低于5%),因此不会引起急性溶血.细胞毒性试验结果表明:TZNT、Ti6Al4V和Ti6Al7Nb在3个时间组(2、4和6 d)的相对细胞增殖率均不低于100%,细胞毒性等级评定为0级,即对细胞不产生毒性.皮下埋植试验结果表明:与Ti6Al4V和Ti6Al7Nb相比,TZNT和TA2植入白鼠体内4周和8周后,无论是炎细胞密度还是植入物周围的纤维膜厚度均有所降低,TZNT合金植入4周后,组织良好,包绕材料的纤维膜较疏松且与组织间的界限不清;随着植入时间延长至8周,炎细胞密度进一步减少,纤维膜也变得更薄,更致密.综合评价结果表明该新型合金具有良好的生物相容性.
参考文献
| [1] | D. M. Gordin;T. Gloriant;Gh. Nemtoi .Synthesis, structure and electrochemical behavior of a beta Ti-12Mo-5Ta alloy as new biomaterial[J].Materials Letters,2005(23):2959-2964. |
| [2] | M. Geetha;A.K. Singh;K. Muraleedharan .Effect of thermomechanical processing on microstructure of a Ti-13Nb-13Zr alloy[J].Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics,2001(1/2):264-271. |
| [3] | GEETHA M;KAMACHI MUDALI U;GOGIA A K;ASOKAMANI R RAJ B .Influence of microstructure and alloying elements on corrosion behavior of Ti-13Nb-13Zr alloy[J].Corrosion Science,2004,46(04):877-892. |
| [4] | Nilson T.C. Oliveira;Giorgia Aleixo;Rubens Caram .Development of Ti-Mo alloys for biomedical applications: Microstructure and electrochemical characterization[J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,2007(0):727-731. |
| [5] | STEINEMANN S G;MAUSLI P A;SZMUKLERMONCLER S;SEMLITSCH M,POHLER O,HINTERMANN H E,PERREN S M.Beta-titanium alloy for surgical implants[A].Warrendale:TMS,1993:2689-2694. |
| [6] | 李军,周廉,李佐臣,陈杜娟.新型医用钛合金Ti-12.5Zr-2.5Nb-2.5Ta的研究[J].稀有金属材料与工程,2003(05):398-400. |
| [7] | 王金友;葛志明;周彦邦.航空α用钛合金[M].上海:上海科学技术出版社,1985:60. |
| [8] | БОРИСОВА E A;陈石卿.钛合金金相学[M].北京:国防工业出版社,1986:4-7. |
| [9] | STEINEMANN S G;PERREN S M.Titanium alloys as metallic biomaterials[A].Münich:FRG,1985:1327-1334. |
| [10] | 梁英教.物理化学[M].北京:冶金工业出版社,1995:369-373. |
| [11] | HELSEN J A;BREME J.Metals as biomaterials[M].New York:wiley,1998:30-40. |
| [12] | Jonsson AK.;Niklasson GA.;Veszelei M. .Electrical properties of ZrO2 thin films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1/2):242-247. |
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