利用乙二胺( Ethylenediamine anhydrous,EDA)/异丙醇(Isopropyl alcohol,IPA)体系对单晶硅(100)面进行了各向异性腐蚀,研究了不同温度、不同反应时间条件下单晶硅表面的绒面结构和表面反射率.利用EDA/IPA 体系得到的金字塔结构尺寸为8μμm左右,但均匀性较差.在1.5％ EDA、5％ IPA体系中添加5％Na2SiO3,80℃反应15min后获得了平均反射率为l1％、表面金字塔结构均匀且尺寸较小的单晶硅绒面.实验结果表明,Na2SiO3的引入使金字塔的尺寸从8μm左右降低至3μm左右,并且均匀度也得到改善.
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