六价铬电沉积工艺毒性高、污染大,三价铬电沉积工艺低毒、低污染,应用前景广阔.运用正交设计法优化了镀铬液配方,确定了其工艺参数,研究了影响脉冲电沉积纳米铬镀层质量的主要工艺因素,分析了镀液组成对铬镀层厚度和电流效率的影响,得到了羧酸盐-尿素体系脉冲电沉积纳米晶铬镀层的最佳工艺.结果表明:影响镀层厚度的主次因素分别是配位剂A(柠檬酸钠)、配位剂B(碳原子数不少于8的一元羧酸盐)和CrCl3˙6H2O的浓度;影响电流效率的主次因素分别是配位剂A、CO(NH2)2和配位剂B的浓度.扫描电镜观察和电子能谱分析结果表明,铬镀层晶粒尺寸小于100nm,厚度均匀,表面光滑,结晶细致.该工艺能制备厚度为11.2um的铬镀层,其电流效率高达25.32%.
参考文献
| [1] | Kim M;Park S U;Kim D Y et al.Characterization of chromium-carbon layer fabricated by electrodeposition in trivalent chromium bath[J].Materials Science Forum,2005,475-479:3 823-3 826. |
| [2] | 何新快;羧酸盐 .尿素体系脉冲电沉积铬及铬合金与铁-镍-铬镀层着黑色研究[D].长沙:中南大学,2006. |
| [3] | 何新快,陈白珍,吴璐烨,李小东,贺全国.三价铬脉冲电沉积纳米晶Ni-Cr合金工艺[J].中国有色金属学报,2006(07):1281-1287. |
| [4] | He X K;Qiu G Z;Chen B Z.Process of Pulse Electrodeposition Nanocrystalline Chromium from Trivalent Chromium Bath[A].Transactions of Nonferrous Metals Society of China,2007:685-691. |
| [5] | 马立文,陈白珍,何新快.羧酸盐尿素体系中三价铬电沉积机理[J].物理化学学报,2007(10):1607-1611. |
| [6] | 邓姝皓 .脉冲电沉积纳米晶铬-镍-铁合金工艺及其基础理论研究[D].中南大学,2003. |
| [7] | Wang F.;Watanabe T. .Preparation and characterization of the electrodeposited Fe-Cr alloy film[J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,2003(1/2):183-190. |
| [8] | Nam K S;Lee K H;Kwon S C et al.Improved wear and corrosion resistance of chromium(Ⅲ) plating by oxynitrocarburising and steam oxidation[J].Materials Letters,2004,58(27 -28):3 540-3 544. |
| [9] | 郑剑,屠振密,李宁,张景双,杨闯.三价铬电镀装饰铬工艺及特性研究[J].材料保护,2008(01):24-27. |
| [10] | 何湘柱,曾振欧,彭荣华,胡耀红,袁国伟.三价铬电沉积非晶态Fe-Ni-Cr合金的研究[J].华南理工大学学报(自然科学版),2003(03):15-20. |
| [11] | Boiadjieva T;Money M;Raiehevski G S .Electrodeposition of zinc-chromium alloys ouree:UPB Scientific Bulletin[J].Series B:Chemistry and Materials Science,2001,63(03):135-140. |
| [12] | Abd E R;Sayed S;Magdy A M et al.Thin films of chromium electrodeposition from a trivalent chromium electrolyte[J].Transactions of the Institute of Metal Finishing,2002,80(01):29-33. |
| [13] | 龚竹青,邓姝皓,陈文汨.脉冲电沉积纳米晶镍-铁-铬合金（Ⅰ）--电沉积工艺[J].中国有色金属学报,2003(02):511-516. |
| [14] | Kwon SC;Kim A;Park SU;Kim DY;Kim D;Nam KS;Choi Y .Characterization of intermediate Cr-C layer fabricated by electrodeposition in hexavalent and trivalent chromium baths[J].Surface & Coatings Technology,2004(2/3):151-156. |
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