反应溅射Ti-Al-Si-N纳米晶复合薄膜的微结构与力学性能

功能材料, 2005, 36(1): 44-46.

反应溅射Ti-Al-Si-N纳米晶复合薄膜的微结构与力学性能

董云杉 ^1, , 孔明 ^2, , 胡晓萍 ^3, , 李戈扬 ^4, , 顾明元 ^5,

1.上海交通大学,金属基复合材料国家重点实验室,上海,200030

2.上海交通大学,金属基复合材料国家重点实验室,上海,200030

3.上海交通大学,金属基复合材料国家重点实验室,上海,200030

4.上海交通大学,金属基复合材料国家重点实验室,上海,200030

5.上海交通大学,金属基复合材料国家重点实验室,上海,200030

基金项目: 上海市纳米科技专项基金(0352nm084)

关键词：反应溅射 , 纳米晶复合薄膜 , 微结构 , 力学性能

Microstructure and mechanical properties of Ti-Al-Si-N nanocrystalline composite films prepared by the reactive sputtering method

采用Ar、N2和SiH4混合气体反应溅射制备了一系列不同Si含量的Ti-Al-Si-N薄膜,并采用EDS、AES、XRD、TEM和微力学探针研究了薄膜的微结构和力学性能.结果表明通过控制混合气体中SiH4分压可以方便地获得不同Si含量的Ti-Al-Si-N纳米晶复合薄膜.当Si含量达到3.5%(原子分数)时,薄膜中出现TiSix界面相,造成(Ti,Al)N晶粒细化,使薄膜力学性能得到提高,硬度和弹性模量的最高值分别为36.0GPa和400GPa.进一步提高Si含量,薄膜的力学性能逐渐降低.

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反应溅射Ti-Al-Si-N纳米晶复合薄膜的微结构与力学性能

Microstructure and mechanical properties of Ti-Al-Si-N nanocrystalline composite films prepared by the reactive sputtering method

参考文献