n-type Polycrystalline Si Thick Films Deposited on SiNx-coated Metallurgical Grade Si Substrates

材料科学技术（英文）, 2015, 31(1): 65-69.

Hongliang Zhang ^1, , Liqiang Zhu ^2, , Liqiang Guo ^3, , Yanghui Liu ^4, , Qing Wan ^5,

1.Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China

2.Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China

3.Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China

4.Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China

5.Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China

基金项目: This project is supported by the National Natural Science Foundation of China (No.11104288),the Ningbo Natural Science Foundation (No.2013A610129) and Zhejiang Province Preferential Post-doctor Funding Project (No.BSH1302050).

n-type Polycrystalline Si Thick Films Deposited on SiNx-coated Metallurgical Grade Si Substrates

Keywords： Thermal chemical vapor deposition

参考文献

[1]	E. Pihan;A. Focsa;A. Slaoui;C. Maurice .Crystallographic analysis of polysilicon films formed on foreign substrates by aluminium induced crystallisation and epitaxy[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(7):15-20.
[2]	E. Aubry;M.N. Ghazzal;V. Demange;N. Chaoui;D. Robert;A. Billard .Poisoning prevention of TiO2 photocatalyst coatings sputtered on soda-lime glass by intercalation of SiNx diffusion barriers[J].Surface & Coatings Technology,2007(18):7706-7712.
[3]	A. Focsa;A. Slaoui;E. Pihan;F. Snijkers;P. Leempoel;G. Beaucarne;J. Poortmans .Poly-Si films prepared by rapid thermal CVD on boron and phosphorus silicate glass coated ceramic substrates[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(7):404-410.
[4]	H.Y. Wang;N. Usami;K. Fujiwara .Microstructures of Si multicrystals and their impact on minority carrier diffusion length[J].Acta materialia,2009(11):3268-3276.

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n-type Polycrystalline Si Thick Films Deposited on SiNx-coated Metallurgical Grade Si Substrates

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