研究了射频等离子体辅助化学气相沉积(PCVD)技术获得的Ti-B-N薄膜的组织结构和力学性能.结果发现,B元素的加入使薄膜中出现TiN纳米晶和BN非晶(nc-TiN/a-BN)的复合结构,其硬度显著高于TiN薄膜,最高可达40 GPa.用球盘式摩擦磨损实验考察了薄膜的磨损特性.结果表明:与TiN薄膜相比,Ti-B-N薄膜抗磨损性能有显著提高,磨损机制与TiN薄膜不同,摩擦系数较TiN稍高.
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