综述了透明导电氧化物(TCO)薄膜的应用和发展,重点阐述了TCO薄膜的透明导电机理以及制备工艺的最新研究进展,同时对其研究和应用前景进行了展望.
参考文献
| [1] | Banerjee A N;Maity R;Chattopadhyay K K .Preparation of p-type transparent conducting CuAlO2 thin films by reactive DC sputtering[J].Materials Letters,2003,58:10. |
| [2] | 叶志镇,张银珠,徐伟中,吕建国.ZnO薄膜p型掺杂的研究进展[J].无机材料学报,2003(01):11-18. |
| [3] | 黄昆.固体物理[M].北京:高等教育出版社,1988:25. |
| [4] | 陈辉明 .[D].杭州:浙江大学,1998. |
| [5] | Al-Ajili A N H;Bayliss S C .A study of the optical,electrical and structural properties of reactively sputtered InOx and ITOx thin film[J].Thin Solis Films,1997,305:106. |
| [6] | Yang M;Yang X L;Chen H X et al.A new transparent conductive thin film[J].Thin Solis Films,2001,394(1-2):218. |
| [7] | Lee Ho-chul;Par O ok.Behaviors of carrier concentration and mobility in indium -tin oxide thin films by DC magnetron sputtering at various oxygen flow rates[J].VACUUM,2004(77):69. |
| [8] | Quaas M;Eggs C;Wulff H.Structural study of ITO thin films with the rietveld method[J].Thin Solis Films,1998(332):277. |
| [9] | Sun X W;Wang L D;Kwok H S.Improved ITO thin films with a thin ZnO buffer layer by sputtering[J].Thin Solis Films,2000(360):75. |
| [10] | 陈猛;闻立时.柔性基片上In2O3:Sn和ZnO:Al薄膜的制备及其电学和光学特性[J].金属学报,1999(04):35. |
| [11] | Chung Wonsuk;Thompson Michael O;Wickboldt Paul et al.Room temperature indium tin oxide by XeCl excimer laser annealing for flexible display[J].Thin Solis Films,2004,460:291. |
| [12] | Fumihito Niino;Hiroshi Hirasawa;Ken-ichi Kondo.Deposition of low-resitivity ITO on plastic substrates by DC arcdischarge ion plating[J].Thin Solis Films,2002(411):28. |
| [13] | Wu Wen-Fa;Bi-Shiou .Deposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputtering[J].Thin Solis Films,1997,298:221. |
| [14] | Ma Jin;Li Shuying;Zhao Junqing et al.Preparation and properties of indium tin oxide deposited on polyester substrates by reactive evaporation[J].Thin Solis Films,1997,307:200. |
| [15] | Park Sung Kyu;Han Jeong In;Kim Won Keun et al.Deposition of indium-tin-oxide films on polymer substrates for application in plastic-based flat panel displays[J].Thin Solis Films,2001,397:49. |
| [16] | Iwata K;Sakemi T .Doping properties of ZnO films for photovoltaic devices grown by URT-IP(ion-plating) method[J].Thin Solis Films,2004,451-452:219. |
| [17] | Ning S H;Boo J H .Influence of target-to-substrate distance on the properties of AZO films grown by RF magnetron sputtering[J].Thin Solis Films,2004,447-448:105. |
| [18] | 姜燮昌.大面积磁控溅射技术的最新进展与应用[C].2004全国真空冶金与表面工程学术研讨会论文集,2004:18-26. |
| [19] | Adurodija FO.;Ishihara T.;Yoshioka H.;Motoyama M.;Murai K.;Izumi H. .Effect of laser irradiation on the properties of indium tin oxide films deposited by pulsed laser deposition[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2001(1/2):114-121. |
| [20] | Al-Pahondi N;Bisht H .Transparent conducting Anti-static and anti-static-anti-glare coating on plastic substrates[J].Thin Solis Films,2001,392:299. |
| [21] | 赵谢群.透明导电氧化物薄膜研究现状与产业化进展[J].电子元件与材料,2000(01):40-41. |
| [22] | 韩雪;夏慧;吴丽君.透明导电膜及靶材[J].电子元件与材料,1998(02):31. |
| [23] | Adurodija F O;Izumi H;Ishihara T et al.Highly conducting indium tin oxide (ITO) thin films deposite by pulsed laser ablation[J].Thin Solis Films,1999,350:79. |
| [24] | Ederth J;Heszler P;Hultaker A et al.Indium tin oxide films made from nanoparticles:models for the optical and electrical properties[J].Thin Solis Films,2003,445:199. |
| [25] | Alma M J;Cameron D C .Characterization of transparent conductive ITO thin films deposited on titanium film by a sol-gel process[J].SURFACE AND COATINGS TECHNOLOGY,2001,6:776. |
| [26] | Annette Hultaker;Kenneth Jarrendahl;Jun Lu;Claes-Goran Granqvist;Gunnar A. Niklasson .Electrical and optical properties of sputter deposited tin doped indium oxide thin films with silver additive[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2001(2):305-310. |
| [27] | Minami Tadatsugu;Yamamoto Takashi .Transparent conducting Zinc-co-doped ITO films prepared by magnetron sputtering[J].Thin Solis Films,2000,9:189. |
| [28] | Meng Y;Hua Z Y et al.A new transparent conductive thin film In2O3:Mo[J].Thin Solis Films,2001,394(1-2):218. |
| [29] | 裴志亮,谭明晖,陈猛,孙超,黄荣芳,闻立时.透明导电氧化物ZnO：Al（ZAO）薄膜的研究[J].金属学报,2000(01):72-76. |
| [30] | Chang JF.;Hon MH.;Wang HL. .Studying of transparent conductive ZnO : Al thin films by RF reactive magnetron sputtering[J].Journal of Crystal Growth,2000(1/4):93-97. |
| [31] | Tadatsugu Minami;Shingo Suzuki;Toshihiro Miyata .Transparent conducting impurity-co-doped ZnO:Al thin films prepared by magnetron sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2001(0):53-58. |
| [32] | Tadasufu Minami et al.Preparation of transparent conducting In4Sn3O12 thin films by DC magnetron sputtering[J].Thin Solis Films,1997,308-309:13. |
| [33] | Tadasufu Minami et al.Highly transparent and conductive ZnO-In2O3 thin films prepared by DC magnetron sputtering[J].Thin Solis Films,1996,290-291(01) |
| [34] | Tadasufu Minami et al.Highly transparent and conductive Rare Earth-doped ZnO thin films prepared by magnetron sputtering[J].Thin Solis Films,2000,366:62. |
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