研究了Ga2O3/Al2O3膜氨化反应自集结制备GaN薄膜的光致发光特性,讨论了发光机制以及生长条件对其光致发光特性的影响.样品的荧光光谱在347 nm有一强发光峰,在412 nm有一弱发光峰,这两个峰的强度都随着氨化温度的升高和氨化时间的增长而增强,但峰的位置保持不变.我们认为347 nm的峰是GaN的带边发光峰由于薄膜中晶粒尺寸的减小而蓝移造成的,而412 nm的发光峰则来源于导带到杂质受主能级的辐射复合.
参考文献
[1] | 叶志镇;黄靖云 .Investigation of Silicon Based Optoelectronic Films[J].稀有金属材料与工程,2001,30(11):676. |
[2] | Amano H;Sanaki N;Akaski I .Metalorgnic Vapor Phase Epitaxial Grown of A High Quality GaN Film Using An AlN Buffer Layer[J].Applied Physics Letters,1986,48(05):353. |
[3] | Chaudhuri J Ng et al.High Resolution X-ray Diffraction and X-ray Topography Study of GaN on Sapphire[J].Material Science and Engineering,1999,B64:99. |
[4] | 梁骏吾 .The Development of Semiconductor Silicon-Based Matrials[J].稀有金属材料与工程,2001,30(11):670. |
[5] | Chen P.;Chen ZZ.;Zhou YG.;Shen B.;Zhang R.;Zheng YD.;Zhu JM.;Wang M.;Wu XS.;Jiang SS.;Feng D.;Xie SY. .Deposition and crystallization of amorphous GaN buffer layers on Si(111)substrates[J].Journal of Crystal Growth,2000(1/2):27-32. |
[6] | Frank AC.;Miskys CR.;Ambacher O.;Giersig M.;Fischer RA.;Stowasser F. .Nanoscale hexagonal gallium nitride from single molecule precursors: Microstructure and crystallite size dependent photoluminescence[J].Physica Status Solidi, A. Applied Research,1998(1):239-243. |
[7] | Chung SJ.;Suh EK.;Lee HJ.;Mao HB.;Park SJ. .Photo luminescence and photocurrent studies of p-type GaN with various thermal treatments[J].Journal of Crystal Growth,2002(1/4):49-54. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%