欢迎登录材料期刊网

材料期刊网

高级检索

采用电弧熔炼、快速球磨结合放电等离子烧结快速制备了单相Si80Ge20Bx(x=0.5、1、1.5、2)热电材料,对烧结后试样进行了物相结构分析和热电性能表征.结果表明,B的引入导致样品载流子浓度增加,电导率随着B掺量增加而大幅增加,而Seebeck系数反之下降.B的固溶增加试样中点缺陷浓度而导致声子散射增加,热导率下降明显.当x=1时,样品在1000K获得最大ZT值0.78.

参考文献

[1] Abeles B;Beers D;Cody G et al.[J].Physical Review,1962,125:44-46.
[2] Rowe D .[J].Journal of Power Sources,1987,19:247-259.
[3] Slack G;Hussain M .[J].Journal of Applied Physics,1991,70(05):2694-2718.
[4] 徐亚东,徐桂英,葛昌纯.纳米散射中心对P型Si80Ge20合金热电性能的影响[J].功能材料,2008(05):802-804,807.
[5] Dismukes J;Ekstrom L;Steigmeier E et al.[J].Journal of Applied Physics,1964,35:2899-2907.
[6] Rowe D;Shukla V;Savvides N .[J].Nature,1981,290:765-766.
[7] Vining C;Laskow W;Hanson J et al.[J].Journal of Applied Physics,1991,69:4333-4340.
[8] Rowe D;Bhandari C.Modern Thermoelectrics[M].London:Prentice-Hall,Inc,1983
[9] Erofeev R;Iordanishvili E;Petrov A .[J].Fizika Tverdogo,1965,7:3054-3062.
[10] Abrosimov N;Rossolenko S;Schroder W et al.[J].Journal of Crystal Growth,1997,174:182-186.
[11] Schilz J;Riffel M;Pixius K et al.[J].Powder Technology,2000,105:149-154.
[12] Xu Y;Xu G;Ge C .[J].Scripta Materialia,2008,58:1070-1073.
[13] Joshi G;Lee H;Lan YC;Wang XW;Zhu GH;Wang DZ;Gould RW;Cuff DC;Tang MY;Dresselhaus MS .Enhanced Thermoelectric Figure-of-Merit in Nanostructured p-type Silicon Germanium Bulk Alloys[J].Nano letters,2008(12):4670-4674.
[14] Wang X;Lee H;Lan Y et al.[J].Applied Physics Letters,2008,93:93121.
[15] Massalski T;Okamoto H;Subramanian P.Binary Alloy Phase Diagrams[M].Ohio:ASM International,1990
[16] Matsui A.;Sumino M.;Yonenaga I. .Czochralski growth of bulk crystals of Ge1-xSix alloys[J].Journal of Crystal Growth,1998(1/2):109-116.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%