采用离子束溅射沉积了不同厚度的Co膜和Cu膜,利用四电极法测量了薄膜的电阻率,从而得到了Co膜和Cu膜的电导率随薄膜厚度的变化关系. 实验结果表明,Co膜和Cu膜的电学特性都具有明显的尺寸效应. 比较了同时考虑表面散射和晶界散射的电导理论得到的电导率公式与实验结果,不同薄膜厚度电导率的理论结果与实验结果符合较好. 提出了厚度作为金属薄膜生长从不连续膜进入连续膜的一个特征判据, 并利用原子力显微镜(AFM)观测了膜厚在特征厚度附近的Co膜和Cu膜的表面形貌.
参考文献
| [1] | Sheng L;Xing D Y .Path-integral approach to the quasiclassical theory for giant magnetoresistance in magnetic multilayers[J].Physical Review B,1994,50(02):1001-1007. |
| [2] | 董正超,盛利,邢定钰,董锦明.金属薄膜的量子输运理论[J].物理学报,1997(03):568-578. |
| [3] | 季航,赵特秀,王晓平,董翊.磁控溅射Mo薄膜电阻率的原位研究[J].物理学报,1993(08):1340-1345. |
| [4] | 杜昊,白雪东,肖金泉,孙超,黄荣芳,闻立时.超薄Ti膜吸收率的尺寸效应[J].材料研究学报,2001(02):215-218. |
| [5] | 唐兆麟;黄荣芳;闻立时 .超薄金属膜电阻率尺寸效应[J].材料研究学报,1997,11(04):438-440. |
| [6] | 邵建达.不连续金属薄膜对短波长软X射线多层膜反射特性的影响[J].中国激光,1998(04):309. |
| [7] | 邵建达,易葵,范正修,王润文,崔明启.短波长软X射线多层膜高级次峰设计与制备[J].物理学报,1997(11):2258-2266. |
| [8] | 刘金声.离子束溅射沉积薄膜技术及应用[M].北京:国防工业出版社,2003 |
| [9] | Evans B L;Xu S .The nucleation and growth of thin films[J].Proceedings of SPIE,1990,1324:90-102. |
| [10] | Xu S;Evans B L .Nucleation and growth of ion beam sputtered metal films[J].Journal of Materials Science,1992,27(11):3108-3117. |
| [11] | Xu S;Evans B L;Flynn D I et al.The study of island growth of ion beam sputtered metal films by digital image processing[J].Thin Solid Films,1994,238(01):54-61. |
| [12] | 范平,齐红基,易葵,叶敏,邵建达,范正修.离子束溅射沉积Co膜光学特性的尺寸效应研究[J].真空科学与技术学报,2004(02):100-104. |
| [13] | Kinbara A;Ueki K .Hall coefficient in vacuum-deposited copper films[J].Thin Solid Films,1972,12(01):63-66. |
| [14] | Reynolds F W;Stilwell G R .Mean free path of electrons in evaporated metal films[J].Physical Review,1952,88(02):418-419. |
| [15] | Mayasdas A F .Intrinsic resistivity and electron mean free path in aluminum films[J].Journal of Applied Physiology,1968,39(09):4241-4245. |
| [16] | Arajs S;Oliver B F;MichalakJ T .Effect of grain boundaries on the electrical resistivity of high-purity iron at 4.2K[J].Journal of Applied Physiology,1967,38(04):1676-1677. |
| [17] | Pattabi M.;Rao KM. .Electrical behaviour of discontinuous silver films deposited on softened polyvinylpyridine substrates[J].Journal of Physics, D. Applied Physics: A Europhysics Journal,1998(1):19-23. |
| [18] | Das V D;Soundararajan N .Size and temperature effects on the thermoelectric power and electrical resistivity of bismuth telluride thin films[J].Physical Review B,1988,37(09):4552-4559. |
| [19] | Ping Fan;Kui Yi;Jian-Da Shao;Zheng-Xiu Fan .Electrical transport in metallic films[J].Journal of Applied Physics,2004(5):2527-2531. |
| [20] | 薛增泉;吴全德;李浩.薄膜物理[M].北京:电子工业出版社,1991 |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%