采用1×1016 ions/cm2的注入剂量对TiNi形状记忆合金进行氮离子注入,注入加速电压为50 keV.采用X射线衍射和X射线光电子能谱对氮离子注入前后TiNi形状记忆合金表面的物相以及化学成分进行了分析.结果表明,氮离子注入前后TiNi合金表面都被氧化.氮离子注入前TiNi形状记忆合金表面存在少量TiO2、Ti3Os和Ti2O3.氮离子注入后的TiNi形状记忆合金表面有TiN新相生成,且在氮离子注入后的TiNi形状记忆合金表面还存在少量TiO2、Ti3O5.
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