大颗粒在等离子体鞘层中的受力分析与计算

金属学报, 2004, 40(10): 1064-.

大颗粒在等离子体鞘层中的受力分析与计算

郭慧梅 , 林国强 , 盛明裕 , 王德真 , 董闯 , 闻立时

大连理工大学三束材料改性国家重点实验室

大连 116024

Ion and Electron beams

Dalian University of Technology

Dalian 116024

关键词：大颗粒 , arc ion plating , pulsed bias

Analysis and Calculation of Forces on Macroparticles in Plasma Sheath

GUO Huimei , LIN Guoqiang , SHENG Mingyu , WANG Dezhen , DONG Chuang , WEN Lishi

Keywords： macroparticle , 电弧离子镀 , 脉冲偏压

用Edelberg 和Aydil的等离子体鞘层模型, 对电弧离子镀中大颗粒在脉冲偏压鞘层中的带电及受力情况进行了分析和计算, 为大颗粒由于带负电而受到电场力排斥从而被净化的实验现象和物理模型提供佐证。

Applying the plasma sheath models given by Edlberg and Aydil, the charging effect and forces acting on macroparticles are analyzed and calculated in pulsed-bias arc ion plating, which gives an evidence to the experimental phenomenon and physical model in which macroparticles would be repulsed from electric force and hence are significantly reduced.

参考文献

[1]
[2]
[3]
[4]
[5]
[6]
[7]
[8]
[9]
[10]
[11]
[12]

上一张下一张

计量

下载量()
访问量()

作者相关

文章评分

您的评分：
1

0%
2

0%
3

0%
4

0%
5

0%

材料期刊网