为提高三倍频光学元件的表面损伤阈值,采用了不同方式对石英基片进行酸蚀刻,利用原子力显微镜观测了基片蚀刻前后的表面微观形貌,并在激光损伤测量装置上进行了R:1方式的阈值测试,比较分析了蚀刻前后基片激光损伤阈值和表面形貌的变化,并比较了不同抛光质量石英基片蚀刻效果的差异.通过实验研究,总结了不同蚀刻方式的优缺点,研究表明酸蚀刻法可以有效提高石英基片激光损伤阈值.
In order to improve the laser damage thresholds of silica substrates,wet etching is used in buffered hydrogen fluoride solution with different processings.The surface appearance of silica substrates after wet etching is observed and different polishing quality on the damage behavior of silica substrates is studied.The advantages and disadvantages among different processings are summarized.The research shows that wet etching can improve the laser damage threshold of silica substrates.
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