射频磁控溅射制备TiO2光催化薄膜的表征

稀有金属材料与工程, 2004, 33(7): 752-754.

射频磁控溅射制备TiO2光催化薄膜的表征

郑树凯 ^1, , 郝维昌 ^2, , 潘峰 ^3, , 张俊英 ^4, , 王天民 ^5, , ^6, , ^7, , ^8, , ^9, , ^10,

1.北京航空航天大学,北京,100083

2.北京航空航天大学,北京,100083

3.北京航空航天大学,北京,100083

4.北京航空航天大学,北京,100083

5.北京航空航天大学,北京,100083

6.Beijing University of Aeronautics and Astronautics,Beijing,100083,China

7.Beijing University of Aeronautics and Astronautics,Beijing,100083,China

8.Beijing University of Aeronautics and Astronautics,Beijing,100083,China

9.Beijing University of Aeronautics and Astronautics,Beijing,100083,China

10.Beijing University of Aeronautics and Astronautics,Beijing,100083,China

基金项目: 国家自然科学基金(H020821250190)

关键词： TiO2薄膜 , 流量比 , 表面粗糙度 , 光催化活性

Characterization of TiO2 Photocatalytic Thin Films Prepared by Radiofrequency Sputtering

Keywords： TiO2 thin film , flow ratio , surface roughness , photocatalytic activity

在不同的Ar和O2气流量比下,利用射频磁控溅射技术在载波片上制备了TiO2薄膜.利用X射线衍射(XRD),原子力显微镜(AFM),拉曼光谱和UV-VIS-NIR分光光度计等技术对薄膜进行了表征.结果表明在Ar∶O2=20 sccm∶5 sccm下制备的薄膜具有较高的光催化活性.

TiO2 thin films were prepared on microscope glass slides by radiofrequency magnetron sputtering method under different flow ratios of Ar and O2 gases. The films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), Raman spectroscopy and UV-VIS spectrophotometer. The results indicated that the film prepared under the flow ratio ofAr:O2=20 sccm:5 sccm has a higher photocatalytic activity.

参考文献

[1]	郑树凯,郝维昌,程躜,潘峰,王天民,赵艳玲,蒋湘宁.表面修饰TiO2光催化薄膜的表征[J].稀有金属材料与工程,2004(02):125-127.
[2]	Hoffmann M R;Martin S T et al.Environmental Application of Semiconductor Photocatalysis[J].Chemical Reviews,1995,95:69-96.
[3]	Takeda S.;Odaka H.;Hosono H.;Suzuki S. .Photocatalytic TiO2 thin film deposited onto glass by DC magnetron sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2001(2):338-344.

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