欢迎登录材料期刊网

材料期刊网

高级检索

强流脉冲离子束在离子能量密度达到5J/cm2的条件下,辐照靶材表面形成二次烧蚀等离子体,可以在基材表面沉积与靶材化学成分一致性良好的膜层.评述了近年强流脉冲离子束沉积功能膜的研究进展,为进一步进行膜层沉积机理和工艺研究提供理论依据.

参考文献

[1] Isakov I F;Kolodii V N;Opekunov M S et al.Sources of high power ion for technological applications[J].Vacuum,1991,42(1-2):159.
[2] Korenev S A;Perry A J .Pulsed high current ion beam processing equipment[J].Surface and Coatings Technology,1997,90:21.
[3] Remnev G E;Shulov V A .Application of high-power ion beams for technology[J].Laser and Particle Beams,1993,11(04):707.
[4] Davis H A;Remnev G E et al.Intense ion-beam treatment of materials[J].MRS Bulletin,1996,21(08):58.
[5] Remnev G E;Isakov I F;Tarbokov V A et al.High intensity pulsed ion beam sources and their industrial applications[J].Surface and Coatings Technology,1999,114:206.
[6] Davis HA.;Munson CP.;Bitteker LJ.;Nastasi MA.;Rej DJ. Waganaar WJ.;Walter KC.;Coates DM.;Schleinitz HM.;Wood BP. .Ion beam and plasma technology development for surface modification at Los Alamos National Laboratory[J].Materials Chemistry and Physics,1998(1/3):213-218.
[7] Yatsui K.;Ohtomo K.;Jiang WH.;Sonegawa T. .Preparation of thin films of dielectric materials using high-density ablation plasma produced by intense pulsed ion beam[J].Materials Chemistry and Physics,1998(1/3):219-223.
[8] 王承遇,刘永兴,马腾才,夏元良.在玻璃上用强流脉冲离子束镀膜的工艺[J].硅酸盐学报,2001(03):249-253.
[9] 刘永兴,王承遇,马腾才,夏元良,谭畅.用强流脉冲离子束(HIPIB)方法在玻璃表面制备ITO膜[J].硅酸盐通报,2001(02):11-16.
[10] 梅显秀,徐军,马腾才.利用强流脉冲离子束技术在室温下沉积类金刚石薄膜研究[J].物理学报,2002(08):1875-1880.
[11] 梅显秀,刘振民,马腾才.基片温度对强流脉冲离子束烧蚀等离子体沉积类金刚石薄膜结构和性能的影响[J].真空科学与技术学报,2003(04):226-230,234.
[12] 梅显秀,马腾才.衬底温度对强流脉冲离子束烧蚀沉积类金刚石薄膜化学结构的影响[J].高等学校化学学报,2003(07):1262-1265.
[13] Remnev G E;Isakov I F;Opekounov M S et al.High power ion beam source for industrial application[J].Surface and Coatings Technology,1997,96:103.
[14] Yutaka S;Meiso U;Shigetoshi H et al.Quick deposition of ZnS:Mn eletroluminescent thin films by intense pulsed ion beams[J].Japanese Journal of Applied Physics,1989,28:468.
[15] Kong X;Masugaate K;Yatsui K .Characteristic of ablation plasma produced by intense pulsed ion beam[J].Japanese Journal of Applied Physics,1994,33:1155.
[16] Kong X;Masugaate K;Yatsui K .Ablation plasma temperature produced by intense pulsed ion beam evaporateion[J].Japanese Journal of Applied Physics,1994,33:L1041.
[17] Meli C A;Grabowski K S;Hinshelwood D D et al.Film deposition and surface modification using intense pulse ionbeams[J].Journal of Vacuum Science and Technology A-Vacuum Surfaces and Films,1995,13:1182.
[18] Yatsui K;Grigoriu C;Masugaate K et al.Preparation of thin films and nanosize powders by intense pulsed ion beam evaporation[J].Japanese Journal of Applied Physics,1997,36:4928.
[19] Johnston G P;Tiwari P;Rej DJ et al.[J].Journal of Applied Physiology,1994,76(10):5949.
[20] Struts V K;Zakoutaev A N;Matvienko V M et al.Formation of protective coatings on metals by intense pulsed ion beam[J].Surface and Coatings Technology,2002,158-159:497.
[21] Le X Y;Yan S et al.Computer simulation of thermal-mechanical effects of high intensity pulsed ion beams on metal surface[J].Surface and Coatings Technology,2000,128-129:381.
[22] Yan S;Le XY;Zhao WJ;Xue JM;Wang YG .A possible thermodynamic mechanism of craters formation on metal surfaces caused by intense pulsed ion beams[J].Surface & Coatings Technology,2005(1/3):69-74.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%